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BITTMANN applied technologies
Matthias Bittmann, Dipl. Phys.
Hirtenweg 54a
27356 Rotenburg (Wümme)
Tel. +49 4261 961805
Mobile:
Web: www.bittmann.com
Email: sales@bittmann.com
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Alcatel SCR650
● 3 Sputter-up cathodes size 8"
● Load-lock
● Process gas supply, MFC, 3 lines
● Hüttinger RF generator, 13.56MHz, 1.2KW
● Impedance matching network
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Perkin-Elmer Randex 2400-8L
more info
- 3 cathodes 8" target
- RF/DC sputter configuration
- Load-lock
- Turbo pumped
- adjustable cathode-substrate table spacing
- substrate pallet dia. max. 6.5"
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Balzers BAK600 PM
Magnetron Sputtering System w/ 4 rectangular targets, drum-type rotating substrate holder
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Kurt Lesker Sputtersystem
Research-type sputtering system w/ load-lock, 4 magnetron targets, RF/DC-power supplies
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Perkin-Elmer 4400
more details
- Sputtering System w/ load-lock
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Alcatel PUMA500
more details
RF/DC Magnetron Sputtering System w/ Load-Lock and Preprocessing Chamber
Cathode diameter: 150 - 200mm Rotable Substrate Table
Power Requirements: 3x 400V @ 50 Hz, 20kVA
Space requirements: 1920 x 1600 x 1470 mm (H x L x D) + cabinet
Vacuum system: 2x Turbopump 5402CP
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Alcatel SCM600
Magnetron Sputter System, 6" capability, Load-Lock, Substrate Bias, Beckhoff PLC, 3 Process gas lines